Nonlinear optical materials and their manufacturing method
US5455431A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 11, 1994 |
| Grant date | Oct 3, 1995 |
| Priority date | — |
| Expiry date | Aug 11, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/3551
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention is directed to new non-linear optical materials and methods for manufacturing these materials. A new materials are non-oxide amorphous thin films which are doped with semiconductor microcrystallites. The use of non-oxide materials as the amorphous thin film prevents the occurrence of undesirable chemical reactions, such as the oxidation of the semiconductor microcrystallites doped therein. The disclosed materials may be manufactured by simultaneously sputtering a target of the selected semiconductor material and a target of the non-oxide amorphous material. Alternatively, reactive sputtering in a non-oxide gas environment may be utilized to deposit the non-oxide amorphous material doped with semiconductor microcrystallites.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.