Analyzer for total reflection fluorescent x-ray and its correcting method
US5457726A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 6, 1994 |
| Grant date | Oct 10, 1995 |
| Priority date | — |
| Expiry date | Oct 6, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/076
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A sample is mounted on a sample base. A detector is provided on the sample base, and detects a fluorescent X-ray generated from the sample, and a scattered X-ray of an incident X-ray when the sample is irradiated with the incident X-ray. A controller controls the sample base and an operation of the detector. The controller sequentially changes an incident angle of the incident X-ray to the sample so as to detect the fluorescent X-ray generated from the sample at each incident angle, and the scattered X-ray of the incident X-ray. Next, the controller obtains the relationship between the incident angle of the incident X-ray to the sample and a standard value obtained by standardizing intensity of the fluorescent X-ray by intensity of the scattered X-ray. Then, the controller corrects the incident angle of the incident X-ray to the sample based on the obtained relationship. Moreover, the controller corrects the positional relationship between an irradiation position of the incident X-ray to the sample and said detector based on the obtained relationship. In this case, the correction of the incident angle of the incident X-ray to said sample is made after ending the correction of the p…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.