Nonlinear optical materials and their manufacturing method
US5464991A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 31, 1994 |
| Grant date | Nov 7, 1995 |
| Priority date | — |
| Expiry date | Oct 31, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/3551
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Non-linear optical materials are formed from amorphous thin films having semiconductor microcrystallites dispersed therein. Amorphous thin films of nitrides or carbides are selected that have a larger bandgap than the bandgap of the semiconductor materials which form the dispersed microcrystallites in order to prevent the surfaces of the microcrystallites from undergoing chemical reactions such as oxidation and the like. The non-linear optical materials are prepared by a sputtering method in which a target formed from the semiconductor material and a separate target formed from the nitrides or carbides are sputtered to produce the non-linear optical material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.