Semiconductor wafer inspection apparatus
US5465145A · kind A · utility
34Cited by
1References
11Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Sep 20, 1994 |
| Grant date | Nov 7, 1995 |
| Priority date | — |
| Expiry date | Sep 20, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed is a semiconductor wafer inspection apparatus which effectively prevents an erroneous identification of small pits as particles on a surface of a sample. In such a semiconductor wafer inspection apparatus, a light collecting portion and a reflection adjustment portion having a light reflectance different from a light reflectance of the light collecting portion are included in light collecting means.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.