Method of forming borderless contacts using a removable mandrel

US5466636A · kind A · utility

Assignee

• International Business Machines Corporation · US

Inventors

• John Cronin · Jericho, US
• Carter W. Kaanta · Colchester, US
• Donald M. Kenney · Shelburne, US
• Michael L. Kerbaugh · Williston, US
• Howard S. Landis · Underhill, US
• Brian J. Machesney · Burlington, US
• Paul C. Parries · Wappingers Falls, US
• Rosemary A. Previti-Kelly · South Burlington, US
• John F. Rembetski · Burlington, US

Key dates

• Filing date: Sep 17, 1992
• Grant date: Nov 14, 1995
• Expiry date: Sep 17, 2012

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S438/943
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A semiconductor fabrication process for forming borderless contacts (130, 170, 172) using a removable mandrel (110). The process involves depositing a mandrel on an underlying barrier layer (100) designed to protect underlying structures (40) formed on a substrate (24). The mandrel is made from a material that will etch at a faster rate than the barrier layer so as to permit the formation of openings in the mandrel to be stopped on the barrier layer without penetrating such layer. After depositing a contact (130) in a first opening (120) formed in the mandrel, a second opening (140) is formed and a second contact (170) is deposited therein. Thereafter, the mandrel is removed and replaced with a layer of solid dielectric material (180).