Optimized ECR plasma apparatus with varied microwave window thickness
US5466991A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Nov 15, 1994 |
| Grant date | Nov 14, 1995 |
| Priority date | — |
| Expiry date | Nov 15, 2014 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF16B2012/2045
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention describes a technique to control the radial profile of microwave power in an ECR plasma discharge. In order to provide for a uniform plasma density to a specimen, uniform energy absorption by the plasma is desired. By controlling the radial profile of the microwave power transmitted through the microwave window of a reactor, the profile of the transmitted energy to the plasma can be controlled in order to have uniform energy absorption by the plasma. An advantage of controlling the profile using the window transmission characteristics is that variations to the radial profile of microwave power can be made without changing the microwave coupler or reactor design.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.