Apparatus for treating substrates in a vacuum chamber

US5468362A · kind A · utility

Assignee

• Leybold GmBH · DE

Inventors

• Peter Mahler · Obertshausen, DE
• Wolfgang Stang · Kefenrod, DE

Key dates

• Filing date: Jan 21, 1994
• Grant date: Nov 21, 1995
• Expiry date: Jan 21, 2014

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/564
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A vacuum chamber houses a rotatable substrate holder next to a door having a cathode target mounted therein. A plate-like mask is movable to a position between the substrate holder and the door so that the target can be cleaned without contaminating the substrate. The mask is preferably moved by a screw jack including a tube driven through a sealed hole in the chamber wall.