Shielding for arc suppression in rotating magnetron sputtering systems
US5470452A · kind A · utility
25Cited by
18References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 29, 1993 |
| Grant date | Nov 28, 1995 |
| Priority date | — |
| Expiry date | Nov 29, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0206
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A cathode body for a rotating cylindrical magnetron wherein the magnetron provides a sputtering zone extending along the length of the cathode body and circumferentially along a relatively narrow region thereof. The cathode body includes an elongated tubular member having a target material at the outer surface thereof. A collar of electrically-conductive material is located at at least one end of the tubular member, and extends along the tubular member from that one end into the erosion zone. A sleeve of electrically-conductive material may extend circumferentially around the collar.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.