Frame-supported pellicle for dustproof protection of photomask
US5470621A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 6, 1994 |
| Grant date | Nov 28, 1995 |
| Priority date | — |
| Expiry date | Jul 6, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/64
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An improvement is proposed for a frame-supported pellicle for dustproof protection of a photomask, which consists of a rigid frame and a transparent plastic membrane adhesively bonded to one end surface of the frame in a slack-free fashion, used in the photolithographic patterning work for the manufacture of fine electronic parts and devices. The improvement is obtained by coating the whole surface of the pellicle frame with a coating composition by the method of electrodeposition so as to completely solve the heretofore unavoidable problem by the dust particle deposition on the pellicle membrane during transportation and handling.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.