Apparatus and method for spin coating wafers and the like
US5472502A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Aug 30, 1993 |
| Grant date | Dec 5, 1995 |
| Priority date | — |
| Expiry date | Aug 30, 2013 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D1/005
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus and method are provided for controlling the rate of drying of a high-viscosity chemical applied to a substantially flat surface of a spinning article. The rate of drying of the chemical is controlled by controlling the saturation level of a solvent in the local atmosphere in which the article is spinning, i.e., in the air space adjacent to the surface of the article. By spinning the article in a solvent-laden vapor, the evaporation of solvent from the chemical is slowed and therefore the rate at which the chemical dries and thickens is also slowed. Spreading of the chemical may also be facilitated and premature drying of the chemical may be avoided by applying to the surface of the article a thin layer of the solvent prior to application of the chemical.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.