Apparatus and method for surface treatment
US5478401A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 7, 1995 |
| Grant date | Dec 26, 1995 |
| Priority date | — |
| Expiry date | Mar 7, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6875
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus and method for surface treatment of a substance to be processed, which are capable of decreasing the number of foreign matters holding on the reverse side of the substance more than prior art like apparatus and method without largely decreasing a surface treating speed as compared with that of the prior art, by supplying ozone gas to the surface of the substance mounted on a supporting base. The supporting base has a heating part and a supporting part. There is provided a supporting material on the surface of the supporting part for partly supporting one side of the substance to be processed so that a required amount of gap may be formed between the substance to be processed and the supporting part. In the heating part is built a heater. And for a member constituting the supporting part is used a material having greater emissivity than a member constituting the heating part.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.