Patent · US Expired

Method and apparatus for handling wafers

US5479108A · kind A · utility

161Cited by
1References
25Claims
0Family size

Assignee

Inventor

Key dates

Filing dateNov 25, 1992
Grant dateDec 26, 1995
Priority date
Expiry dateNov 25, 2012

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S414/141
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method and apparatus for handling wafers. A wafer pick moves along a horizontal x-axis to unload a wafer from a cassette and position the wafer over a chuck. The chuck moves upwardly along a z-axis perpendicular to the surface of the wafer and lifts the wafer off the pick. The pick retracts through a slot in the chuck and a test probe moves along the x-axis to position itself over the wafer and chuck with reference to a calculated wafer center. The chuck then moves upwardly to engage the surface of the wafer with the probe. Wafer characteristics are tested at several test points located on a circle on the surface of the wafer by repeatedly lowering the chuck, rotating the chuck by a small amount, and raising the chuck to engage the wafer with the probe. The probe is then positioned to test another circle of points.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.