Mid and deep-uv antireflection coatings and methods for use thereof
US5482817A · kind A · utility
47Cited by
30References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 29, 1994 |
| Grant date | Jan 9, 1996 |
| Priority date | — |
| Expiry date | Sep 29, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S522/904
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflective coating composition (ARC) for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.