Optical element and projection exposure apparatus employing the same
US5485497A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 14, 1994 |
| Grant date | Jan 16, 1996 |
| Priority date | — |
| Expiry date | Feb 14, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/06
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical element which allows replication of a refined pattern and a projection exposure apparatus employing the optical element are disposed so that side face portions of predetermined patterns which create shadows from oblique incident exposure radiation may be minimized at a predetermined incidence angle of vacuum ultrasonic radiation or X-radiation, or the patterns of the optical element are formed such that the direction in which incident radiation is reflected regularly and the direction of side faces of the patterns may extend in parallel to each other. When the optical element is irradiated to replicate or image the patterns of the optical element, refined patterns can be replicated or imaged.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.