Chemical vapor deposition method of growing oxide films with giant magnetoresistance
US5487356A · kind A · utility
16Cited by
5References
10Claims
0Family size
Assignee
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Key dates
| Filing date | Nov 28, 1994 |
| Grant date | Jan 30, 1996 |
| Priority date | — |
| Expiry date | Nov 28, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F1/0009
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A chemical vapor deposition method for forming films or coatings of metal oxide films showing a giant magnetoresistive effect, with the metal oxides having the formula La.sub.x A.sub.1-x MnO.sub.3 wherein A is selected from the group consisting of barium, calcium, manganese, and strontium, and x is a number in the range of from 0.2 to 0.4. The method uses a liquid source delivery CVD approach, wherein source reagent solution precursor is flash vaporized and is delivered to a CVD chamber, wherein it decomposes to deposit the multicomponent metal oxide films with well-controlled stoichiometry.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.