Method and apparatus for exposure of substrates
US5495279A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Mar 5, 1993 |
| Grant date | Feb 27, 1996 |
| Priority date | — |
| Expiry date | Mar 5, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0082
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method for exposure of patterns described in one or several databases containing geometrical descriptions of said patterns by means of writing with a focussed laser light onto substrates which are photosensitive at the wavelength of the laser light, comprising the steps of PA1 moving the substrate during the writing procedure in a first direction (y) relative to a fixed frame, PA1 continuously moving the optics focussing laser light on said photosensitive surface in a second direction (x) essentially perpendicular to the first direction, PA1 spreading the focussed laser light on the photosensitive surface in the first direction (y) for forming an extended focus area, and PA1 independently controlling the focussed laser light hitting more than 100 position increments spaced in the first direction (y) across the extended focus area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.