Micronic Laser Systems AB
111Patents
43Active
111Granted
48Portfolio score
Filing activity: Mar 5, 1993 → May 13, 2013 · 36 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6687041B1 | Pattern generator using EUV | Electricity | 240 | Expired |
| US6747783B1 | Pattern generator | Electricity | 235 | Expired |
| US6285488A | Pattern generator for avoiding stitching errors | Electricity | 133 | Expired |
| US6891655B2 | High energy, low energy density, radiation-resistant optics used with micro-electromechanical devices | Performing Operations; Transporting | 115 | Expired |
| US6885493B2 | Method and a device for reducing hysteresis or imprinting in a movable micro-element | Physics | 97 | Expired |
| US6618185B2 | Defective pixel compensation method | Physics | 73 | Expired |
| US6504644B1 | Modulator design for pattern generator | Electricity | 67 | Expired |
| US6883158B1 | Method for error reduction in lithography | Physics | 65 | Expired |
| US7369217B2 | Method and device for immersion lithography | Physics | 53 | Expired |
| US5635976A | Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate | Electricity | 45 | Expired |
| US6428940B1 | Method for pattern generation with improved image quality | Electricity | 45 | Expired |
| US7061226B2 | Method to detect a defective element | Physics | 44 | Expired |
| US7424330B2 | Method and apparatus for controlling deformable actuators | Physics | 37 | Active |
| US5495279A | Method and apparatus for exposure of substrates | Electricity | 36 | Expired |
| US6717097B1 | Data path for high performance pattern generator | Emerging Cross-Sectional Technologies | 35 | Expired |
| US7444616B2 | Method for error reduction in lithography | Physics | 35 | Expired |
| US7302111B2 | Graphics engine for high precision lithography | Physics | 34 | Expired |
| US7150949B2 | Further method to pattern a substrate | Physics | 32 | Expired |
| US6399261B1 | Pattern generator with improved precision | Electricity | 31 | Expired |
| US6819490B2 | Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece | Physics | 28 | Expired |
| US6373619B1 | Pattern generator with improved address resolution | Electricity | 28 | Expired |
| US6816302B2 | Pattern generator | Electricity | 26 | Expired |
| US7710634B2 | Pattern generator | Electricity | 25 | Active |
| US6624880B2 | Method and apparatus for microlithography | Physics | 24 | Expired |
| US6833854B1 | Method for high precision printing of patterns | Physics | 23 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.