X-ray mask and its fabrication method
US5496667A · kind A · utility
7Cited by
5References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 24, 1995 |
| Grant date | Mar 5, 1996 |
| Priority date | — |
| Expiry date | Apr 24, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In order to provide an X-ray absorber low in the internal stress and suitable for forming a high accurate pattern and its fabrication method, an X-ray absorber for an X-ray mask is intended to contain tungsten and nitrogen, or tungsten, titanium and nitrogen, and to have an amorphous structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.