Photosensitive resin composition used in a method for forming a light-shielding film
US5498498A · kind A · utility
11Cited by
8References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 1, 1994 |
| Grant date | Mar 12, 1996 |
| Priority date | — |
| Expiry date | Aug 1, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133512
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a photosensitive resin composition for use in a light-shielding film, comprising a photosensitive resin and a light-shielding coloring material, wherein light transmission properties after formation of the light-shielding film are controlled by the light-shielding coloring material so that (i) the light transmission through the light-shielding film is 1% or more in at least one wavelength of a light wavelength region of from 330 nm to less than 425 nm, and (ii) the light transmission through the light-shielding film is 2% or less in a light wavelength region of from 425 to 650 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.