Positive photoresist composition containing photoacid generator and use thereof
US5498765A · kind A · utility
13Cited by
5References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 26, 1994 |
| Grant date | Mar 12, 1996 |
| Priority date | — |
| Expiry date | Sep 26, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive acting photoresist comprising a film forming reactive polymer; an iodonium initiator or a non-ionic compound that generates triflic acid upon exposure to radiation; and a multifunctional organic carboxylic acid is provided as well as use thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.