Film forming method wherein a partial pressure of a reaction byproduct in a processing container is reduced temporarily
US5503875A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Mar 17, 1994 |
| Grant date | Apr 2, 1996 |
| Priority date | — |
| Expiry date | Mar 17, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4584
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A film is formed on a substrate by supplying a plurality of processing gases into a processing container and forming the film on the substrate from the processing gases while exhausting a portion of the gases out of the processing container. Before a partial pressure of a byproduct in the processing container produced through chemical reaction of the processing gases reaches an equilibrium state, the partial pressure of the byproduct in the processing container is temporarily reduced by temporarily suppressing or stopping the supply of at least one of the processing gases into the processing container and exhausting gas from the processing container.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.