Endpoint detection utilizing ultraviolet mass spectrometry
US5504328A · kind A · utility
82Cited by
9References
21Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 9, 1994 |
| Grant date | Apr 2, 1996 |
| Priority date | — |
| Expiry date | Dec 9, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/16
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus and method for detecting the endpoint of an etch during semiconductor fabrication is provided. The endpoint detection system utilizes a mass spectrometer having an energy source located outside the vacuum chamber of the endpoint detection system, thus providing an easily replaceable energy source. The energy source may be a light source to provide photo-ionization. The energy source may be selected based upon the gas species of the etch of which an endpoint as being detected. The energy is directed into an ionization chamber of the endpoint detection system through a transparent window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.