Multi-source reactive deposition process for the preparation of blue light emitting phosphor layers for AC TFEL devices

US5505986A · kind A · utility

Assignee

• PLANAR SYSTEMS, INC. · US

Inventors

• Karl-Otto Velthaus · Kleinmachnow, DE
• Reiner Mauch · Guldental, DE
• T. Achim Oberacker · Gärtringen, DE
• Hans-Werner Schock · Stuttgart, DE
• Sey-Shing Sun · Portland, US
• Randall Wentross · Portland, US
• Richard T. Tuenge · Hillsboro, US

Key dates

• Filing date: Feb 14, 1994
• Grant date: Apr 9, 1996
• Expiry date: Feb 14, 2014

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05B33/10
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

A multi-source reactive deposition process for preparing a phosphor layer for an AC TFEL device having the chemical formula M.sup.II M.sup.III.sub.2 X.sub.4 :RE, where M.sup.II is a group II metal taken from the group magnesium, calcium, strontium and barium, M.sup.III is a group III metal taken from the group aluminum, gallium and indium, X is taken from the group sulfur and selenium, and RE comprises a rare earth activator dopant taken from the group cerium and europium is disclosed. The phosphor film is formed in crystalline form on a substrate heated to a temperature between 400.degree. and 800.degree. C. by depositing more than one deposition source chemical where at least one of the deposition source chemicals of the group II metal or the group III metal is a compound.