Chemically amplified resist composition and process for forming resist pattern using same
US5506088A · kind A · utility
17Cited by
4References
4Claims
0Family size
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Key dates
| Filing date | Nov 3, 1994 |
| Grant date | Apr 9, 1996 |
| Priority date | — |
| Expiry date | Nov 3, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Improved chemically amplified resist is provided that comprises 100 parts by weight of a copolymer produced from a first monomer unit having a recurrent acid labile pendant group that changes the polarity of the polymer and a second monomer unit having an alkali-soluble group and 1 to 20 parts by weight of a photo acid generator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.