Making polymer thin films for optical uses
US5511143A · kind A · utility
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2Claims
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Inventors
Key dates
| Filing date | Feb 14, 1994 |
| Grant date | Apr 23, 1996 |
| Priority date | — |
| Expiry date | Feb 14, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method is disclosed for the deposition of plasma films in which the optical index of refraction of the deposited film can be varied continuously or discontinuously as the material is deposited. The change in refractive index is accomplished by changing the input power applied to the plasma chamber. The method can be used to create optical wave guides from material of a single input monomer vapor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.