Jeffrey Tobin
31Patents
8h-index
52Co-inventors
78Inventor score
Filing activity: Sep 24, 1991 → Mar 15, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6200412A | Chemical vapor deposition system including dedicated cleaning gas injection | Emerging Cross-Sectional Technologies | 149 | Expired |
| US5619103A | Inductively coupled plasma generating devices | Electricity | 47 | Expired |
| US6613199B1 | Apparatus and method for physical vapor deposition using an open top hollow cathode magnetron | Electricity | 28 | Expired |
| US6589398B1 | Pasting method for eliminating flaking during nitride sputtering | Electricity | 11 | Expired |
| US9558982B2 | Minimal contact edge ring for rapid thermal processing | Electricity | 10 | Active |
| US5217749A | Method of making polymer thin films for optical uses | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6225744A | Plasma process apparatus for integrated circuit fabrication having dome-shaped induction coil | Electricity | 8 | Expired |
| US6471831B2 | Apparatus and method for improving film uniformity in a physical vapor deposition system | Electricity | 8 | Expired |
| US10626500B2 | Showerhead design | Electricity | 7 | Active |
| US5304255A | Photovoltaic cell with photoluminescent plasma polymerized film | Emerging Cross-Sectional Technologies | 6 | Expired |
| US9683308B2 | Method and apparatus for precleaning a substrate surface prior to epitaxial growth | Chemistry; Metallurgy | 6 | Active |
| US6468404B2 | Apparatus and method for reducing redeposition in a physical vapor deposition system | Electricity | 6 | Expired |
| US10049881B2 | Method and apparatus for selective nitridation process | Electricity | 3 | Active |
| US10221483B2 | Showerhead design | Electricity | 3 | Active |
| US9659809B2 | Support cylinder for thermal processing chamber | Electricity | 3 | Active |
| US10529541B2 | Inductive plasma source with metallic shower head using B-field concentrator | Electricity | 2 | Active |
| US9403251B2 | Minimal contact edge ring for rapid thermal processing | Electricity | 2 | Active |
| US10128144B2 | Support cylinder for thermal processing chamber | Electricity | 2 | Active |
| US9929029B2 | Substrate carrier system | Electricity | 2 | Active |
| US9905454B2 | Substrate transfer mechanisms | Electricity | 2 | Active |
| US9048190B2 | Methods and apparatus for processing substrates using an ion shield | Electricity | 2 | Active |
| US10519547B2 | Susceptor design to eliminate deposition valleys in the wafer | Electricity | 1 | Active |
| US9385004B2 | Support cylinder for thermal processing chamber | Electricity | 1 | Active |
| US11581408B2 | Method and apparatus for selective nitridation process | Electricity | 0 | Active |
| US10837122B2 | Method and apparatus for precleaning a substrate surface prior to epitaxial growth | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.