Plasma treatment apparatus and method for operating same
US5515986A · kind A · utility
48Cited by
5References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 3, 1994 |
| Grant date | May 14, 1996 |
| Priority date | — |
| Expiry date | May 3, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus for plasma treating workpieces in vacuum includes a stack of plasma chambers (20). Handling of workpieces to and from the plasma chambers of the stack is performed in parallelism by one handling device and through lateral handling openings of the plasma chambers. The handling device is rotatable around an axis parallel to the handling openings of the plasma chambers and comprises transport apparatus simultaneously movable radially with respect to the axis of rotation towards and from the handling openings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.