Exposure apparatus
US5523574A · kind A · utility
9Cited by
1References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 24, 1995 |
| Grant date | Jun 4, 1996 |
| Priority date | — |
| Expiry date | May 24, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/70
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus has an illumination system for illuminating a mask with a light beam, a projection optical system for projecting a mask pattern on a photosensitive substrate and a carriage for integrally holding the mask and the photosensitive substrate. The exposure apparatus further has a detection system for detecting a change in attitude of the carriage and a correction system for correcting a positional deviation between the mask and the photosensitive substrate on the basis of a detected result of the detection system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.