Charged beam apparatus having cleaning function and method of cleaning charged beam apparatus
US5539211A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 29, 1994 |
| Grant date | Jul 23, 1996 |
| Priority date | — |
| Expiry date | Dec 29, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/022
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged beam apparatus comprises a source tank provided outside the column and containing a plasma source, a plasma generating apparatus for generating plasma from a plasma source supplied from the source tank, gate valves and an exhausting pump for introducing plasma generated by the plasma generating apparatus into the column and for exhausting the plasma therefrom, and an O-ring for restricting a passage of plasma in the column such that those portions of cleaning portions to be cleaned to which internal contaminants stick are mainly exposed to plasma. Therefore, it is possible to generation of an oxide film, a fluoride film, or the likes which cause drifting can be restricted.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.