Itsuko Sakai
20Patents
7h-index
60Co-inventors
72Inventor score
Filing activity: Jul 2, 1992 → Feb 23, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5312519A | Method of cleaning a charged beam apparatus | Electricity | 56 | Expired |
| US5466942A | Charged beam irradiating apparatus having a cleaning means and a method of cleaning a charged beam irradiating apparatus | Electricity | 39 | Expired |
| US6642149B2 | Plasma processing method | Electricity | 35 | Expired |
| US5717294A | Plasma process apparatus | Electricity | 34 | Expired |
| US5539211A | Charged beam apparatus having cleaning function and method of cleaning charged beam apparatus | Electricity | 33 | Expired |
| US6782907B2 | Gas recirculation flow control method and apparatus for use in vacuum system | Emerging Cross-Sectional Technologies | 16 | Expired |
| US7022616B2 | High speed silicon etching method | Electricity | 7 | Expired |
| US7186315B2 | Plasma treatment apparatus | Electricity | 6 | Expired |
| US6780278B2 | Plasma processing apparatus with reduced parasitic capacity and loss in RF power | Electricity | 6 | Expired |
| US6938638B2 | Gas circulating-processing apparatus | Emerging Cross-Sectional Technologies | 4 | Expired |
| US7628931B2 | Processing method for conservation of processing gases | Electricity | 4 | Active |
| US7767055B2 | Capacitive coupling plasma processing apparatus | Electricity | 3 | Active |
| US6038461A | Plastically deformable high temperature superconductive material and method of manufacturing formed body thereof | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8339615B2 | Edge detection method for transparent substrate by detecting non-light-emitting region of transparent substrate | Electricity | 2 | Active |
| US7368876B2 | Plasma processing apparatus | Electricity | 2 | Expired |
| US6689699B2 | Method for manufacturing a semiconductor device using recirculation of a process gas | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8580652B2 | Semiconductor device and manufacturing method thereof | Electricity | 1 | Active |
| US10026622B2 | Method for manufacturing semiconductor device | Electricity | 0 | Active |
| US10672615B2 | Plasma processing apparatus and plasma processing method | Electricity | 0 | Active |
| US7182879B2 | Plasma processing method | Emerging Cross-Sectional Technologies | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.