Semiconductor arrangement and method for its manufacture
US5541140A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 23, 1994 |
| Grant date | Jul 30, 1996 |
| Priority date | — |
| Expiry date | Jun 23, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D8/00
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Semiconductor arrangements, in particular diodes, have a p-layer and two n-layers that are doped to varying degrees of thickness. The p-n junction between the p-layer and the heavily doped n-layer is arranged in the chip so as to allow it to lie completely inside the chip. The p-n junction between the p-layer and the n-layer is situated in the outside areas of the chip. This arrangement does not permit any high field strengths to occur on the outside of the chip and, at the same time, it makes it possible for easily reproducible properties to be achieved. The manufacturing method can also be carried-out outside of a clean room.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.