Patent · US Expired

Interferometric measurement and alignment technique for laser scanners

US5541731A · kind A · utility

64Cited by
14References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 18, 1995
Grant dateJul 30, 1996
Priority date
Expiry dateMay 18, 2015

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K3/0017
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A desired design for electronic structures is converted into a graphic design format and sorted into a pseudo-raster format corresponding to scan lines. A laser or other machining beam is controlled by a separate tracking beam utilizing a mid-objective scanning system. The firing frequency of the machining beam is determined by the position of the tracking beam on a detector, as compared to the scan line data. Accuracy is verified by detection of plume or spectra generated during machining. Evaluation and alignment of the machining and tracking beams is by interferometric methods. The system improves optical performance parameters of telecentricity, angle of scanned beam line, location of line in which the scanned line resides, astigmatism and field curvature.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.