Photoresist composition with photosensitive base generator
US5545509A · kind A · utility
37Cited by
14References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 1, 1994 |
| Grant date | Aug 13, 1996 |
| Priority date | — |
| Expiry date | Feb 1, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/038
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to an improved lithographic photoresist composition comprising a photosensitive base generator. The composition is useful in the manufacture of integrated circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.