Patent · US Expired

Nonlinear optical device and method of manufacturing same

US5547705A · kind A · utility

11Cited by
1References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 4, 1992
Grant dateAug 20, 1996
Priority date
Expiry dateSep 4, 2012

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB82Y20/00
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A nonlinear optical device comprising a substrate and a film structure coated on to the substrate. The film has, in a direction normal to the substrate, an intercalation structure including a semiconductor layer and an organic layer that lave different energy gaps. The intercalation structure includes a plurality of semiconductor layers and a plurality of organic layers which comprise a quantum well system. The film structure includes an assembly of microcrystals having domain size smaller than that of the wavelength of light with which the device operates. The microcrystals have an axis aligned in a direction normal to the substrate and have randomly oriented axes in a direction parallel to the substrate. A method for producing the device comprises providing a solution of an organic material in a solvent and placing a quantity of the solution on a substrate to form the organic material film structure thereon. The film is formed by spin coating of the solution on the substrate. Preferably the film is comprised of a two-dimensional perovskite such as (C.sub.10 H.sub.21 NH.sub.3).sub.2 PbI.sub.4. The solvent is acetone or dimethoxyl ethane.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.