Method and apparatus for depositing a substance with temperature control
US5551983A · kind A · utility
16Cited by
24References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 1, 1994 |
| Grant date | Sep 3, 1996 |
| Priority date | — |
| Expiry date | Nov 1, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4584
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for depositing a substance with temperature control includes, in one embodiment: a mandrel rotatable on an axis; a spacer mounted on the mandrel; a substance mounted on the spacer; a plasma, containing constituents of the substance being deposited, directed toward the substrate; the spacer having a thermal conductance in its thickness direction that varies with radial dimension.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.