Method for supplying liquid material and process for forming thin films using the liquid material supplying method
US5552181A · kind A · utility
15Cited by
13References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 21, 1993 |
| Grant date | Sep 3, 1996 |
| Priority date | — |
| Expiry date | Dec 21, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4482
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of supplying, in a gaseous phase, a material which is in a viscous liquid phase at normal temperature. The viscous liquid material is provided in a bubbler and the pressure of the vessel is maintained below atmospheric pressure. A carrier gas is supplied through a nozzle opening in the liquid material inside the vessel. The carrier gas is temporarily dissolved in the liquid and then released to form fine bubbles into which the liquid material is vaporized, so that the vapor of the material is supplied together with the carrier gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.