Parylene deposition apparatus including dry vacuum pump system and downstream cold trap
US5556473A · kind A · utility
38Cited by
10References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 27, 1995 |
| Grant date | Sep 17, 1996 |
| Priority date | — |
| Expiry date | Oct 27, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G2261/3424
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Chemical vapor deposition apparatus is provided for the quick and efficient deposition of Parylene AF4 onto silicon wafers in the production of semiconductor chips. The apparatus includes an oilless, dry vacuum pump connected rierctly to the deposition chamber, and a liquid nitrogen cooled cold trap connected to the outlet of the vacuum pump. The apparatus further includes a vacuum by-pass assembly wherein a high-conductance vacuum outlet is utilized to quickly reduce pressure in the chamber system and a low-conductance vacuum manifold outlet is utilized to maintain vacuum flow during the deposition procedure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.