Multi mask method for selective mask feature enhancement
US5563012A · kind A · utility
65Cited by
5References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 30, 1994 |
| Grant date | Oct 8, 1996 |
| Priority date | — |
| Expiry date | Jun 30, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The preferred embodiment of the present invention is a method of enhancing normally unenhanced features types. Pattern shapes are placed on two or more relatively simple, modified masks instead of using a single mask containing diverse feature types. On these modified masks, (hereinafter "overlay masks"), all of the features are the type normally enhanced. A composite pattern is printed into photoresist through successive exposure to the overlay masks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.