Mark Neisser
37Patents
12h-index
75Co-inventors
84Inventor score
Filing activity: Apr 24, 1986 → Feb 14, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5795685A | Simple repair method for phase shifting masks | Physics | 74 | Expired |
| US5563012A | Multi mask method for selective mask feature enhancement | Physics | 65 | Expired |
| US6844131B2 | Positive-working photoimageable bottom antireflective coating | Emerging Cross-Sectional Technologies | 57 | Expired |
| US8088548B2 | Bottom antireflective coating compositions | Physics | 54 | Active |
| US5283104A | Via paste compositions and use thereof to form conductive vias in circuitized ceramic substrates | Emerging Cross-Sectional Technologies | 53 | Expired |
| US7824837B2 | Positive-working photoimageable bottom antireflective coating | Emerging Cross-Sectional Technologies | 45 | Active |
| US5094769A | Compliant thermally conductive compound | Electricity | 44 | Expired |
| US8329387B2 | Antireflective coating compositions | Chemistry; Metallurgy | 37 | Active |
| US6346979B1 | Process and apparatus to adjust exposure dose in lithography systems | Physics | 34 | Expired |
| US5337475A | Process for producing ceramic circuit structures having conductive vias | Emerging Cross-Sectional Technologies | 25 | Expired |
| US8691925B2 | Compositions of neutral layer for directed self assembly block copolymers and processes thereof | Physics | 21 | Active |
| US5213704A | Process for making a compliant thermally conductive compound | Chemistry; Metallurgy | 14 | Expired |
| US7081511B2 | Process for making polyesters | Emerging Cross-Sectional Technologies | 12 | Expired |
| US8835581B2 | Neutral layer polymer composition for directed self assembly and processes thereof | Chemistry; Metallurgy | 11 | Active |
| US7264913B2 | Antireflective compositions for photoresists | Emerging Cross-Sectional Technologies | 11 | Expired |
| US8039202B2 | Positive-working photoimageable bottom antireflective coating | Emerging Cross-Sectional Technologies | 10 | Active |
| US8524441B2 | Silicon-based antireflective coating compositions | Electricity | 9 | Active |
| US7070914B2 | Process for producing an image using a first minimum bottom antireflective coating composition | Emerging Cross-Sectional Technologies | 9 | Expired |
| US8686109B2 | Methods and materials for removing metals in block copolymers | Chemistry; Metallurgy | 8 | Active |
| US8632948B2 | Positive-working photoimageable bottom antireflective coating | Physics | 8 | Active |
| US8568958B2 | Underlayer composition and process thereof | Physics | 7 | Active |
| US7816071B2 | Process of imaging a photoresist with multiple antireflective coatings | Emerging Cross-Sectional Technologies | 7 | Expired |
| US7553905B2 | Anti-reflective coatings | Emerging Cross-Sectional Technologies | 7 | Active |
| US8465902B2 | Underlayer coating composition and processes thereof | Physics | 6 | Active |
| US6800415B2 | Negative-acting aqueous photoresist composition | Emerging Cross-Sectional Technologies | 5 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.