Patent · US Expired

Method and device for chemically treating substrates

US5569330A · kind A · utility

61Cited by

7References

27Claims

0Family size

Assignee

Steag MicroTech GmbH Donaueschingen · DE

Inventors

Robin Schild · Reutlingen, DE
Milan F. Kozak · Raleigh, US
Johann Durst · Neckartenzlingen, DE

Key dates

Filing date	Jan 13, 1995
Grant date	Oct 29, 1996
Priority date	—
Expiry date	Jan 13, 2015

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S134/902
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A method for treating substrates includes chemically treating at least one substrate in a container with at least one treatment fluid and washing said at least one substrate with a washing fluid in the same container. Subsequently, the at least one substrate is dried.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.