Pattern defect inspection method and apparatus
US5574800A · kind A · utility
38Cited by
6References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 23, 1994 |
| Grant date | Nov 12, 1996 |
| Priority date | — |
| Expiry date | Aug 23, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/95607
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The pattern edge direction in reference image data of an object to be examined is detected, the reference image data is differentiated using a differential operator in a direction along the pattern edge direction, and inspection image data obtained by picking up an image of the object to be inspected is differentiated using the differential operator in the direction along the pattern edge direction. The differential data obtained by the differential processing are compared with the inspection image data, and a pattern defect on the object to be inspected is detected based on the difference between these data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.