Scanning light exposure apparatus
US5579147A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 6, 1994 |
| Grant date | Nov 26, 1996 |
| Priority date | — |
| Expiry date | Dec 6, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70791
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A scanning light exposure apparatus comprises illumination optical systems for radiating light beams to a plurality of sub-areas in a pattern area of a mask, a plurality of projection optical systems arranged along a predetermined direction for projecting erected images of unity magnification of the sub-areas by the light beams transmitted through the mask onto a photo-sensitive substrate, a diaphragm member arranged at a substantially conjugate position to the photo-sensitive substrate in each illumination optical system for limiting a projection area of the sub-area to the photo-sensitive substrate, scanning means for synchronously scanning said mask and said photo-sensitive substrate substantially transversely to the predetermined direction relative to said projection optical systems and diaphragm control means for changing a width of an aperture of each diaphragm member along a direction transverse to the predetermined direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.