Method and apparatus for preventing distortion of horizontal quartz tube caused by high temperature
US5584934A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Oct 13, 1995 |
| Grant date | Dec 17, 1996 |
| Priority date | — |
| Expiry date | Oct 13, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/44
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to an improved equipment in semiconductor processing. The invention includes a horizontal quartz tube surrounded with heating element for processing wafers, an inlet pipe of a gas injector mounted at the center of the closed end of a horizontal quartz tube, four sheath supports each being 90 degrees apart located at the closed end of a horizontal quartz tube for supporting a thermocouple sheath. The horizontal quartz tube is rotated 90 degrees every 14 to 15 days in a predetermined direction. As the horizontal quartz tube is rotated, the thermocouple sheath is always inserted into the sheath support located at the bottom of the horizontal quartz tube.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.