Resist composition with radiation sensitive acid generator
US5585220A · kind A · utility
27Cited by
6References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 1, 1995 |
| Grant date | Dec 17, 1996 |
| Priority date | — |
| Expiry date | Dec 1, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.