Block exposure pattern data extracting system and method for charged particle beam exposure
US5590048A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 4, 1993 |
| Grant date | Dec 31, 1996 |
| Priority date | — |
| Expiry date | Jun 4, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31776
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a block exposure pattern extracting system applied to a charged-particle beam exposure system having a block mask including a plurality of transparent stats having different shapes, a comparator unit compares first vectors connecting one of apexes of an input exposure pattern to other apexes thereof with second vectors connecting a reference point which is one of apexes of a unit block exposure pattern to other apexes of the unit block exposure pattern. A determining unit determines whether or not the first vectors coincide with the second vectors. An extracting unit extracts the input exposure pattern as the unit block exposure pattern when the determining unit determines that the first vectors coincide with the second vectors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.