Patent · US Expired

Photochemically modified diamond surfaces, and method of making the same

US5593783A · kind A · utility

9Cited by
4References
7Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJun 17, 1994
Grant dateJan 14, 1997
Priority date
Expiry dateJun 17, 2014

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/30
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

Diamond and diamond-like materials having photochemically modified surfaces, and a process for photochemically modifying the surface of diamond and diamond-like materials. Preferably, the substrate to be modified is a single crystal, polycrystalline film or powder of diamond or any silicon carbide polytype. Photochemical modification of the surface enables the addition or exchange of specific surface functional groups. These surface modifiers change the chemical, adhesive and electronic properties of the diamond and diamond-like substrate materials. The modified subtrates are useful for producing semiconductor devices for use at high temperatures, high powers, and in otherwise harsh environments.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.