Optical integrator and projection exposure apparatus using the same
US5594526A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 5, 1995 |
| Grant date | Jan 14, 1997 |
| Priority date | — |
| Expiry date | May 5, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70075
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection exposure apparatus including a light source system, an optical integrator for forming a plurality of light source images, and a condenser optical system for illuminating a target illumination surface in a rectangular or circular arc pattern in a multiple manner. The optical integrator has, from a light source side, a first lens group which has a plurality of first lens element groups each consisting of a plurality of first lens elements, and a second lens group which has a plurality of second lens element groups each consisting of a plurality of second lens elements. The second lens elements are arranged in a one-to-one correspondence with the first lens elements, and dimensions of the lens section of the first and second lens element satisfy a predetermined relations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.