Patent · US Expired

Method of producing micromechanical structures

US5595940A · kind A · utility

9Cited by
5References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 22, 1995
Grant dateJan 21, 1997
Priority date
Expiry dateMay 22, 2015

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01P15/0802
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

In a method of producing micromechanical structures on semiconductor components, in particular on the surface of a wafer containing integrated circuits, provision is made for the micromechanical structures to be provided subsequently on a fully processed semiconductor component using process steps which are normally applied in semiconductor component production and are at most slightly modified, but independently of the semiconductor component production process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.