Method of producing micromechanical structures
US5595940A · kind A · utility
9Cited by
5References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 22, 1995 |
| Grant date | Jan 21, 1997 |
| Priority date | — |
| Expiry date | May 22, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01P15/0802
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In a method of producing micromechanical structures on semiconductor components, in particular on the surface of a wafer containing integrated circuits, provision is made for the micromechanical structures to be provided subsequently on a fully processed semiconductor component using process steps which are normally applied in semiconductor component production and are at most slightly modified, but independently of the semiconductor component production process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.