Frame-supported pellicle for photolithography
US5597669A · kind A · utility
7Cited by
2References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 7, 1995 |
| Grant date | Jan 28, 1997 |
| Priority date | — |
| Expiry date | Sep 7, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31544
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Proposed is a frame-supported pellicle for dustproof protection of a photomask in the photolithographic patterning work for the manufacture of fine electronic devices having excellent mechanical properties and durability of the pellicle membrane against air blow and ultraviolet irradiation. The advantages of the inventive frame-supported pellicle is obtained by the use of, in place of conventional cellulose-based polymers and fluorocarbon-based resins, a norbornene-based plastic resin as the material of the pellicle membrane spread over and adhesively bonded to one end surface of a rigid frame in a slack-free fashion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.