Pattern evaluation apparatus and a method of pattern evaluation
US5602645A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Sep 13, 1995 |
| Grant date | Feb 11, 1997 |
| Priority date | — |
| Expiry date | Sep 13, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/62
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention provides a pattern evaluating device including light irradiating means for irradiating the rays of light from a light source upon an object, an objective lens through which the light having penetrated through the object passes, an aperture member stopping the diameter of a light beam which has passed the objective lens, a photo receiving element receiving the light beam which has had the diameter stopped by the aperture member, and judging means for evaluating the pattern, following the information of the light received by the photo receiving element and which corresponds to the pattern, wherein the aperture member is capable of changing the numerical aperture, depending whether or not the sample is provided with a pericle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.